Author: Ruijl, T.A.M.
Paper Title Page
Design of Next Generation Beam Line Equipment by Applying Advanced Mechatronic Principles  
  • T.A.M. Ruijl
    MI-Partners, Eindhoven, The Netherlands
  Next generation experiments clearly require beamline equipment with fast and accurate positioning of samples and ultra-stable positioning of optics. Going from the classical quasi-static positioning (point to point) to scanning applications requires a different kind of equipment. The approach to design quasi-static equipment versus scanning equipment with high dynamic performance is very different as well. The shift required in such design approach takes a significant amount of time as it involves new technologies and design experience, to fulfill the high-end requirements finally with sufficient reliability. A market segment, where ultra-precision manufacturing equipment is already required for several decades, is the semiconductor manufacturing industry. Starting with high-end mechatronic equipment in the 90’s, involvement of mechatronics in this area increased very rapidly over the last years. Extremely high precision, with ultra-fast and reliable equipment to fulfill the throughput demands pushes mechatronic developments. Nowadays this equipment requires stages moving at velocities of several m/s, with several tens of m/s2 of accelerations while reaching nm positioning accuracy. Besides extreme reliability to achieve the targets of 100% uptime during 24/7 production, throughput is a driving parameter. Over the years, design principles have been developed to reach these extreme performances. These strategies and principles can also be used for the design next generation beam line equipment. This paper will address some of the principles and how they are applied in a double crystal monochromator at Brazilian light source (LNLS).  
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