MOPC04
ANL, Lemont, Illinois, USA
The Instrumentation Development, Evaluation & Analysis Beamline (IDEA Beamline) will characterize the performance of the state-of-the-art X-ray optics and devices planned for the Advanced Photon Source Upgrade (APS-U). The expected two orders of magnitude increase in brightness along with the increased power density due to the circular aspect ratio of the X-ray beam produced by the Multi-bend Achromat (MBA) magnetic lattice in the upgraded storage ring will set new demanding performance requirements on optical components. The upgrade offers a coherent source that many beamlines will utilize for proposed experimental studies, and it is essential that the chosen optics preserve the coherence of the X-ray beam from undulator to sample. The scientific goal of the IDEA Beamline is to obtain performance metrics for proposed beamline optics and components for the APS-U to ensure the best performance of both the planned featured beamlines and the enhanced beamlines. Questions being explored at the IDEA beamline are wavefront and coherence preservation, monochromator stability, optics surface quality, and effects of high heat loads on optical components. One of the objectives is to directly map monochromator vibration and crystal surface roughness to wavefront degradation. Currently the APS-U does not have a suitable testing location for X-ray optics and components that provides the necessary flux or brightness to simulate the planned APS-U source. The IDEA beamline fills this gap. Measurements will simulate the expected MBA upgraded operating conditions for the tested systems and the data obtained will be used to validate, optimize, or re-engineer for best possible performance.
ANL, Lemont, Illinois, USA
A novel design for a weldable copper chromium zirconium (CuCrZr) mask has been developed for use in Advanced Photon Source Upgrade (APSU) beamlines. In the past, welding has been avoided for CuCrZr; however, the approach this alternative utilizes promises to drastically reduce cost and lead time over traditional brazed CuCrZr and welded Glidcop mask designs. Multiple thermal analyses of the mask have predicted that it will meet required mechanical and thermal requirements suitable for high heat load applications. As of the writing of this paper, a prototype is being fabricated for installation and testing on the 28-ID Coherent High Energy X-ray (CHEX) beamline.
ANL, Lemont, Illinois, USA
Kirkpatrick and Baez (K-B) mirror-based nanofocusing optics* will be applied to many beamlines endstation instruments for the APS-Upgrade (APS-U) project. Precision nanopositioning stages with nanometer-scale linear positioning resolution and nanoradian-scale angular stability are needed as alignment apparatus for the K-B mirror hard X-ray nanofocusing optics. For instance, at the APS-U 19-ID In Situ Nanoprobe beamline endstation**, to maintain stability of a 20-nm focal spot on the sample, nanofocusing K-B mirror system with 5-nrad angular stability is required. Similar angular resolution and stability are also required for APS-U 9-ID CSSI***, APS-U 34-ID ATOMIC**** and other beamline endstation instruments. Modular nanopositioning flexure stages have been developed for the K-B mirror nanofocusing optics, which includes: linear vertical and horizontal flexure stages, tip-tilting flexure stages, and flexure mirror benders for bendable nanofocusing K-B mirrors, to overcome the performance limitations of precision ball-bearing-based or roller-bearing-based stage systems. The mechanical design and preliminary test results are described in this paper.
* Kirkpartrick and Baez, JOSA. 1948; 38(9): 766-773.
** S. Kearney et al., this conference.
*** J. Anton et al., this conference.
**** C. Preissner et al., this conference.